Hafnium nitrate
Names
Other names
Hafnium tetranitrate
Identifiers
3D model (JSmol)
ChemSpider
EC Number
  • 239-536-7
  • InChI=1S/Hf.4NO3/c;4*2-1(3)4/q+4;4*-1
    Key: TZNXTUDMYCRCAP-UHFFFAOYSA-N
  • [N+](=O)([O-])[O-].[N+](=O)([O-])[O-].[N+](=O)([O-])[O-].[N+](=O)([O-])[O-].[Hf+4]
Properties
Hf(NO3)4
Molar mass 426.53 g/mol
Appearance White crystals
moderately soluble[1]
Hazards
GHS labelling:
GHS03: OxidizingGHS07: Exclamation mark
Danger
H272, H315, H319, H335
P210, P220, P221, P305, P338, P405, P501
Related compounds
Related compounds
 Thorium nitrate, Zirconium nitrate, titanium nitrate
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
Infobox references

Hafnium(IV) nitrate is an inorganic compound, a salt of hafnium and nitric acid with the chemical formula Hf(NO3)4.[2][3][4]

Synthesis

Hafnium nitrate can be prepared by the reaction of hafnium tetrachloride and dinitrogen pentoxide.[5]

Properties

Hafnium nitrate is slightly volatile, and can be sublimed at 110 °C and 0.1 mmHg.[6] Hafnium nitrate decomposes on heating (≥ 160°C) to HfO(NO3)2 and then to HfO2.[6]

Applications

Hafnium nitrate can be used for the preparation of materials containing hafnium dioxide.[6]

References

  1. ↑ "Hafnium Nitrate (CAS: 15509-05-4) | Stanford Advanced Materials". samaterials.com. Retrieved 29 October 2021.
  2. ↑ "Hafnium(IV) nitrate". Sigma Aldrich. Retrieved 29 October 2021.
  3. ↑ "Hafnium Nitrate". American Elements. Retrieved 29 October 2021.
  4. ↑ The Metallurgy of Hafnium. Naval Reactors, Division of Reactor Development, U.S. Atomic Energy Commission. 1960. p. 31. Retrieved 29 October 2021.
  5. ↑ Zhuang, Weiwei; Conley, John F.; Ono, Yoshi; Evans, David R.; Solanki, R. (January 2002). "Hafnium Nitrate Precursor Synthesis and HfO2 Thin Film Deposition". Integrated Ferroelectrics. 48 (1): 3–12. Bibcode:2002InFer..48....3Z. doi:10.1080/10584580215449. S2CID 50290009.
  6. 1 2 3 Conley, J. F.; Ono, Y.; Zhuang, W.; Tweet, D. J.; Gao, W.; Mohammed, S. K.; Solanki, R. (2002). "Atomic Layer Deposition of Hafnium Oxide Using Anhydrous Hafnium Nitrate". Electrochemical and Solid-State Letters. 5 (5): C57. doi:10.1149/1.1462875. ISSN 1099-0062. Retrieved 29 October 2021.
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